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Ferroelectric properties of ion-irradiated bismuth ferrite layers grown via molecular-beam epitaxy

Cornell Affiliated Author(s)

Author

Antonio Mei
Sahar Saremi
Ludi Miao
Matthew Barone
Yongjian Tang
Cyrus Zeledon
Jürgen Schubert
Daniel Ralph
Lane Martin
Darrell Schlom

Abstract

We systematically investigate the role of defects, introduced by varying synthesis conditions and by carrying out ion irradiation treatments, on the structural and ferroelectric properties of commensurately strained bismuth ferrite BixFe2-xO3 layers grown on SrRuO3-coated DyScO3(110)o substrates using adsorption-controlled ozone molecular-beam epitaxy. Our findings highlight ion irradiation as an effective approach for reducing through-layer electrical leakage, a necessary condition for the development of reliable ferroelectrics-based electronics. © 2019 Author(s).

Date Published

Journal

AIP Publishing

Volume

7

Issue

11

URL

https://www.scopus.com/inward/record.uri?eid=2-s2.0-85074521450&doi=10.1063%2f1.5125809&partnerID=40&md5=69510f72a084808095abf4fd9b66ee5e

DOI

10.1063/1.5125809

Funding Source

1708615
1719875
1740286
SRC

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