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Epitaxial growth and electronic properties of mixed valence YbAl3 thin films

Cornell Affiliated Author(s)

Author

S. Chatterjee
S.H. Sung
D.J. Baek
L.F. Kourkoutis
D.G. Schlom
K.M. Shen

Abstract

We report the growth of thin films of the mixed valence compound YbAl3 on MgO using molecular-beam epitaxy. Employing an aluminum buffer layer, epitaxial (001) films can be grown with sub-nm surface roughness. Using x-ray diffraction, in situ low-energy electron diffraction, and aberration-corrected scanning transmission electron microscopy, we establish that the films are ordered in the bulk as well as at the surface. Our films show a coherence temperature of 37 K, comparable to that reported for bulk single crystals. Photoelectron spectroscopy reveals contributions from both f13 and f12 final states establishing that YbAl3 is a mixed valence compound and shows the presence of a Kondo Resonance peak near the Fermi-level. © 2016 Author(s).

Date Published

Journal

Journal of Applied Physics

Volume

120

Issue

3

URL

https://www.scopus.com/inward/record.uri?eid=2-s2.0-84979556432&doi=10.1063%2f1.4958336&partnerID=40&md5=b1e821ccc180589b3c186f831e40c9da

DOI

10.1063/1.4958336

Group (Lab)

Kyle Shen Group

Funding Source

0847385
1120296
1429155

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