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Adsorption-controlled growth of La-doped BaSnO3 by molecular-beam epitaxy

Cornell Affiliated Author(s)

Author

H. Paik
Z. Chen
E. Lochocki
Ariel Seidner
A. Verma
N. Tanen
J. Park
M. Uchida
S. Shang
B.-C. Zhou
Mario Brützam
R. Uecker
Z.-K. Liu
D. Jena
K.M. Shen
D.A. Muller
D.G. Schlom

Abstract

Epitaxial La-doped BaSnO3 films were grown in an adsorption-controlled regime by molecular-beam epitaxy, where the excess volatile SnOx desorbs from the film surface. A film grown on a (001) DyScO3 substrate exhibited a mobility of 183 cm2 V-1 s-1 at room temperature and 400 cm2 V-1 s-1 at 10 K despite the high concentration (1.2 × 1011 cm-2) of threading dislocations present. In comparison to other reports, we observe a much lower concentration of (BaO)2 Ruddlesden-Popper crystallographic shear faults. This suggests that in addition to threading dislocations, other defects - possibly (BaO)2 crystallographic shear defects or point defects - significantly reduce the electron mobility. © 2017 Author(s).

Date Published

Journal

APL Materials

Volume

5

Issue

11

URL

https://www.scopus.com/inward/record.uri?eid=2-s2.0-85036471994&doi=10.1063%2f1.5001839&partnerID=40&md5=55cddea3610e96022eb6fc0086e1f0f1

DOI

10.1063/1.5001839

Group (Lab)

Kyle Shen Group

Funding Source

DMR-1539918
ECCS-15420819
FA9550-16-1-0192
DMR-1719875

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