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Gate-Tunable Anomalous Hall Effect in a 3D Topological Insulator/2D Magnet van der Waals Heterostructure

Cornell Affiliated Author(s)

Author

Vishakha Gupta
Rakshit Jain
Yafei Ren
Xiyue Zhang
Husain Alnaser
Amit Vashist
Vikram Deshpande
David Muller
Di Xiao
Taylor Sparks
Daniel Ralph

Abstract

We demonstrate advantages of samples made by mechanical stacking of exfoliated van der Waals materials for controlling the topological surface state of a three-dimensional topological insulator (TI) via interaction with an adjacent magnet layer. We assemble bilayers with pristine interfaces using exfoliated flakes of the TI BiSbTeSe2and the magnet Cr2Ge2Te6, thereby avoiding problems caused by interdiffusion that can affect interfaces made by top-down deposition methods. The samples exhibit an anomalous Hall effect (AHE) with abrupt hysteretic switching. For the first time in samples composed of a TI and a separate ferromagnetic layer, we demonstrate that the amplitude of the AHE can be tuned via gate voltage with a strong peak near the Dirac point. This is the signature expected for the AHE due to Berry curvature associated with an exchange gap induced by interaction between the topological surface state and an out-of-plane-oriented magnet. © 2022 American Chemical Society. All rights reserved.

Date Published

Journal

American Chemical Society (ACS)

Volume

22

Issue

17

Number of Pages

7166-7172,

URL

https://www.scopus.com/inward/record.uri?eid=2-s2.0-85137389462&doi=10.1021%2facs.nanolett.2c02440&partnerID=40&md5=00f377843c29e56bf5719a23c5b8bf17

DOI

10.1021/acs.nanolett.2c02440

Funding Source

1936383
DMR-2104268
DMR-1719875
NNCI-2025233
FA9550-19-1-0390
CB20-68EO-01

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